Determination of Young's modulus and yield strength of porous low-k dielectric films by nanoindentation under complete consideration of the substrate influence. (2nd April 2009)

• Record Type: Journal Article
• Authors: Herrmann, M.; Richter, F.
• Is Part Of: International journal of surface science and engineering. Volume 3:Number 1/2(2009)
• Page Start: 64
• Page End: 85
• Publication Date: 2009-04-02
• Subjects: Young&#39 -- s modulus -- yield strength -- porous dielectric films -- low-k dielectric films -- substrate influence -- indentation -- nanoindentation -- effectively shaped indenter -- porous materials -- plastic deformation; Surfaces (Physics) -- Periodicals; Surface chemistry -- Periodicals; Surfaces (Technology) -- Periodicals; Tribology -- Periodicals; 530.417
• Languages: English
• ISSNs: 1749-785X

Abstract

The capabilities of the 'effective indenter method' with respect to the characterisation of porous xerogel thin films have been investigated using samples with porosities ranging from 43% to 57%. Young's modulus of the samples was decreasing from 2.67 GPa to 0.83 GPa with growing porosity. Yield strength was determined using spherical indentation data. With a larger indenter (R = 48 μm) the 'effective indenter method' could be directly applied while for a smaller one (R = 4.2 μm) the 'effective indenter extrapolation method' had to be utilised to account for the larger amount of plastic deformation. Both approaches delivered the same yield strength decreasing from (140 ± 5) MPa to (75 ± 3) MPa with increasing porosity.