Attempts to form the 10-nm-order pitch of self-assembled nanodots using PS-PDMS block copolymer. (21st April 2014)
- Record Type:
- Journal Article
- Title:
- Attempts to form the 10-nm-order pitch of self-assembled nanodots using PS-PDMS block copolymer. (21st April 2014)
- Main Title:
- Attempts to form the 10-nm-order pitch of self-assembled nanodots using PS-PDMS block copolymer
- Authors:
- Huda, Miftakhul
Liu, Jing
Mohamad, Zulfakri Bin
Yin, You
Hosaka, Sumio - Abstract:
- Block copolymer (BCP) self-assembly exhibits its ability to form various nanostructures with a size down to 3 nm, which is particularly attractive for emerging technologies such as bit patterned media (BPM). Poly(styrene-b-dimethyl siloxane) (PS-PDMS) has been acknowledged as the most promising block copolymer for self-assembly fabrication due to its possibility to form nanopattern with a fine pitch, high etching selectivity, and its characteristic of robustness for pattern transfer. Here, we attempt to form PS-PDMS self-assembled nanodot array with a 10-nm-order pitch in order to satisfy the demand of low cost technique to form ultrahigh density nanodot array for BPM, which is regarded as the next-generation magnetic recording media, and for quantum devices such as the third-generation quantum dot photovoltaic cell and future battery cell. In this study, self-assembled nanodot array on a large area with pitches of 11 nm ( σ = 2.08 nm) and 10 nm ( σ = 1.61 nm) was formed using PS-PDMS with molecular weights of 5600–1300 g/mol (minority block volume fraction fPDMS = 19.8%) and 4700–1200 g/mol (fPDMS = 21.4%), respectively. In experiments, it was shown that some critical parameters, such as the thickness of PS-PDMS film, the treatment of the substrate surface, and annealing condition, played crucial roles in forming 10-nm-order size of self-assembled nanodot array using PS-PDMS. The relationships between pitches of PS-PDMS nanodot array and the product of the total numberBlock copolymer (BCP) self-assembly exhibits its ability to form various nanostructures with a size down to 3 nm, which is particularly attractive for emerging technologies such as bit patterned media (BPM). Poly(styrene-b-dimethyl siloxane) (PS-PDMS) has been acknowledged as the most promising block copolymer for self-assembly fabrication due to its possibility to form nanopattern with a fine pitch, high etching selectivity, and its characteristic of robustness for pattern transfer. Here, we attempt to form PS-PDMS self-assembled nanodot array with a 10-nm-order pitch in order to satisfy the demand of low cost technique to form ultrahigh density nanodot array for BPM, which is regarded as the next-generation magnetic recording media, and for quantum devices such as the third-generation quantum dot photovoltaic cell and future battery cell. In this study, self-assembled nanodot array on a large area with pitches of 11 nm ( σ = 2.08 nm) and 10 nm ( σ = 1.61 nm) was formed using PS-PDMS with molecular weights of 5600–1300 g/mol (minority block volume fraction fPDMS = 19.8%) and 4700–1200 g/mol (fPDMS = 21.4%), respectively. In experiments, it was shown that some critical parameters, such as the thickness of PS-PDMS film, the treatment of the substrate surface, and annealing condition, played crucial roles in forming 10-nm-order size of self-assembled nanodot array using PS-PDMS. The relationships between pitches of PS-PDMS nanodot array and the product of the total number of segments and the Flory-Huggins segmental interaction parameter (χN) obtained by calculations and experiments will be discussed. Based on the position of PS-PDMS on mean-field phase diagram for BCP melts, the possibility to form nanodot array with a pitch of less than 10 nm is described. This study promises to open way toward the fabrication of more than 7.45 Tbit/in. 2 storage devices and the application of quantum devices. … (more)
- Is Part Of:
- International journal of nanotechnology. Volume 11:Number 5/6/7/8(2014)
- Journal:
- International journal of nanotechnology
- Issue:
- Volume 11:Number 5/6/7/8(2014)
- Issue Display:
- Volume 11, Issue 5/6/7/8 (2014)
- Year:
- 2014
- Volume:
- 11
- Issue:
- 5/6/7/8
- Issue Sort Value:
- 2014-0011-NaN-0000
- Page Start:
- 425
- Page End:
- 433
- Publication Date:
- 2014-04-21
- Subjects:
- nanolithography -- self-assembly -- block copolymer -- nanodot -- bit patterned media -- magnetic storage.
620.505 - Journal URLs:
- http://www.inderscience.com/ijnt ↗
http://www.inderscience.com/ ↗ - Languages:
- English
- ISSNs:
- 1475-7435
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store - Ingest File:
- 8901.xml