Cite
HARVARD Citation
Pey, K. et al. (2007). Nano-characterisation of dielectric breakdown in the various advanced gate stack MOSFETs. International journal of nanotechnology. pp. 347-376. [Online].
This is an interim version of our Electronic Legal Deposit Catalogue-eJournals and eBooks while we continue to recover from a cyber-attack.
Pey, K. et al. (2007). Nano-characterisation of dielectric breakdown in the various advanced gate stack MOSFETs. International journal of nanotechnology. pp. 347-376. [Online].