213 nm pitch standards fabricated using atomic lithography. (1st January 2012)

• Record Type: Journal Article
• Authors: Ma, Yan; Gong, Weigang; Zhang, Wanjing; Li, Tongbao
• Is Part Of: International journal of nanomanufacturing. Volume 8:Number 4(2012)
• Page Start: 348
• Page End: 356
• Publication Date: 2012-01-01
• Subjects: nanopitch standard -- atomic lithography -- cooled atoms; Nanostructured materials industry -- Periodicals; Nanotechnology -- Periodicals; 620.505
• Languages: English
• ISSNs: 1746-9392

Abstract

Atomic lithography is a technique in which nearly resonant light is used to pattern an atom beam periodically. In this article, a 425 nm laser light standing wave is used to focus a beam of chromium atoms to fabricate the period of the nanoscale pitch standards of 213 ± 0.1 nm. The height was 4 nm. The (FWHM) width is 64 ± 6 nm. And this result will be analysed theoretically. The tracing of atoms is numerical simulated based on particle-optics and the factors of affecting deposition result will be found in this article.