Nanometrology at PTB in support of process control of nanoscale features in semiconductor manufacturing. (1st January 2012)

• Record Type: Journal Article
• Authors: Bodermann, Bernd; Scholze, Frank; Flügge, Jens; Gross, Hermann; Bosse, Harald
• Is Part Of: International journal of nanomanufacturing. Volume 8:Number 1/2(2012)
• Page Start: 4
• Page End: 22
• Publication Date: 2012-01-01
• Subjects: semiconductor manufacturing -- CD metrology -- pattern placement metrology -- scatterometry -- high resolution microscopy -- signal modelling -- straightness metrology; Nanostructured materials industry -- Periodicals; Nanotechnology -- Periodicals; 620.505
• Languages: English
• ISSNs: 1746-9392

Abstract

We report on recent developments at the PTB in the field of dimensional nanometrology with a special focus on instrumentation, measurement and simulation methods, and standards which are used in semiconductor lithography manufacturing processes. Important dimensional measurands to be controlled precisely during the high volume manufacturing processes of nanoscale features (< 32 nm node) are the positions and widths of features on lithographic masks and wafers as well as the relative positioning or overlay of features.