A nanoscratch method for measuring hardness of thin films. (17th November 2011)

• Record Type: Journal Article
• Authors: Liu, Sheng; Huang, Han; Gu, Yuantong
• Is Part Of: International journal of nanomanufacturing. Volume 7:Number 5/6(2011)
• Page Start: 427
• Page End: 435
• Publication Date: 2011-11-17
• Subjects: thin film -- nanoscratch -- finite element method -- FEM -- hardness measurement; Nanostructured materials industry -- Periodicals; Nanotechnology -- Periodicals; 620.505
• Languages: English
• ISSNs: 1746-9392

Abstract

Thin solid films were extensively used in the making of solar cells, cutting tools, magnetic recording devices, etc. As a result, the accurate measurement of mechanical properties of the thin films, such as hardness and elastic modulus, was required. The thickness of thin films normally varies from tens of nanometers to several micrometers. It is thus challenging to measure their mechanical properties. In this study, a nanoscratch method was proposed for hardness measurement. A three-dimensional finite element method (3-D FEM) model was developed to validate the nanoscratch method and to understand the substrate effect during nanoscratch. Nanoindentation was also used for comparison. The nanoscratch method was demonstrated to be valuable for measuring hardness of thin solid films.