Stable Silicene in Graphene/Silicene Van der Waals Heterostructures. Issue 49 (8th October 2018)

• Record Type: Journal Article
• Authors: Li, Geng; Zhang, Lizhi; Xu, Wenyan; Pan, Jinbo; Song, Shiru; Zhang, Yi; Zhou, Haitao; Wang, Yeliang; Bao, Lihong; Zhang, Yu‐Yang; Du, Shixuan; Ouyang, Min; Pantelides, Sokrates T.; Gao, Hong‐Jun
• Is Part Of: Advanced materials. Volume 30:Issue 49(2018)
• Page Start: n/a
• Page End: n/a
• Publication Date: 2018-10-08
• Subjects: density functional theory -- graphene -- scanning tunneling microscopy -- silicene -- van der Waals heterostructures; Materials -- Periodicals; Chemical vapor deposition -- Periodicals; 620.11
• DOI: 10.1002/adma.201804650
• Languages: English
• ISSNs: 0935-9648

Abstract

Abstract: Silicene‐based van der Waals heterostructures are theoretically predicted to have interesting physical properties, but their experimental fabrication has remained a challenge because of the easy oxidation of silicene in air. Here, the fabrication of graphene/silicene van der Waals heterostructures by silicon intercalation is reported. Density functional theory calculations show weak interactions between graphene and silicene layers, confirming the formation of van der Waals heterostructures. The heterostructures show no observable damage after air exposure for extended periods, indicating good air stability. The I – V characteristics of the vertical graphene/silicene/Ru heterostructures show rectification behavior. Abstract : Graphene/silicene van der Waals heterostructures are fabricated by intercalating Si atoms between graphene and a Ru substrate. By adjusting the Si dosage, silicene nanoflakes, monolayers, and multilayers are observed to form beneath the graphene. These heterostructures show good air stability for extended periods. The I – V characteristics of the vertical heterostructures show rectification behavior.