Branched Hydrosilane Oligomers as Ideal Precursors for Liquid‐Based Silicon‐Film Deposition. Issue 45 (4th October 2017)

• Record Type: Journal Article
• Authors: Haas, Michael; Christopoulos, Viktor; Radebner, Judith; Holthausen, Michael; Lainer, Thomas; Schuh, Lukas; Fitzek, Harald; Kothleitner, Gerald; Torvisco, Ana; Fischer, Roland; Wunnicke, Odo; Stueger, Harald
• Is Part Of: Angewandte Chemie international edition. Volume 56:Issue 45(2017)
• Page Start: 14071
• Page End: 14074
• Publication Date: 2017-10-04
• Subjects: oligomerization -- silanes -- silicon films -- thin films -- UV/Vis spectroscopy; Chemistry -- Periodicals; 540
• DOI: 10.1002/anie.201707525
• Languages: English
• ISSNs: 1433-7851

Abstract

Abstract: Herein a convenient synthetic method to obtain 2, 2, 3, 3‐tetrasilyltetrasilane3 and 2, 2, 3, 3, 4, 4‐hexasilylpentasilane4 on a multigram scale is presented. Proton‐coupled 29 Si NMR spectroscopy and single‐crystal X‐ray crystallography enabled unequivocal structural assignment. Owing to their unique properties, which are reflected in their nonpyrophoric character on contact with air and their enhanced light absorption above 250 nm, 3 and4 are valuable precursors for liquid‐phase deposition (LPD) and the processing of thin silicon films. Amorphous silicon (a‐Si:H) films of excellent quality were deposited starting from3 and characterized by conductivity measurements, ellipsometry, optical microscopy, and Raman spectroscopy. Abstract : Higher silanes with eight or more silicon atoms were synthesized on a multigram scale by a convenient synthetic method. Owing to their unique properties, including their nonpyrophoric nature when in contact with air and their enhanced light absorption above 250 nm, these silanes were found to be excellent precursors for the deposition of silicon films from solution (see picture).