Passive film on 2205 duplex stainless steel studied by photo-electrochemistry and ARXPS methods. (January 2019)

• Record Type: Journal Article
• Authors: Yao, Jizheng; Macdonald, Digby D.; Dong, Chaofang
• Is Part Of: Corrosion science. Volume 146(2019)
• Page Start: 221
• Page End: 232
• Publication Date: 2019-01
• Subjects: A. Stainless steel -- B. Potentiostatic -- XPS -- C. Passive films; Corrosion and anti-corrosives -- Periodicals; 620.11223
• DOI: 10.1016/j.corsci.2018.10.020
• Languages: English
• ISSNs: 0010-938X

Abstract

Highlights: Nondestructive photo-electrochemical technique was used to study the semiconductor properties of passive film on 2205 DSS. The semiconductor types and band gap energies were analyzed by photo-electrochemical and Mott-Schottky methods. ARXPS technique was used to distinguish the composition of inner layer and barrier layer of the passive film on 2205 DSS. Abstract: The passive film formed on 2205 duplex stainless steel in pH 8.59 borate buffer solutions was studied by photo-electrochemical techniques and Mott-Schottky analysis. The passive film displays both n-type and p-type semiconductor character in different potential regions of the passive state. The band gap energy of barrier layer of the passive film was 2.4∼2.75 eV. Additionally, the composition of passive film was analyzed by AR-XPS; at -400∼100 mVSCE and above 600 mVSCE Fe2 O3, Fe3 O4, FeOOH and CrO3 dominate the passive film, showing n-type semi-conductivity; while at 100∼600 mVSCE the passive film comprises FeO, Cr2 O3 and Cr(OH)3, exhibiting p-type semi-conductivity.