The Influence of Deposition Rates on Properties of AlPcCl Thin Films and on the Performance of Planar Organic Solar Cells. Issue 12 (29th September 2017)

• Record Type: Journal Article
• Authors: Mohammed‐Krarroubik, A.; Morsli, M.; Khelil, A.; Cattin, L.; Barkat, L.; Tuo, S.; El Jouad, Z.; Louarn, G.; Ghamnia, M.; Addou, M.; Bernède, J. C.
• Is Part Of: Physica status solidi. Volume 214:Issue 12(2017)
• Page Start: n/a
• Page End: n/a
• Publication Date: 2017-09-29
• Subjects: hole mobility -- molecular orientation -- organic solar cells -- photovoltaics -- phthalocyanines; Solid state physics -- Periodicals; Solids -- Industrial applications -- Periodicals; 530.41
• DOI: 10.1002/pssa.201700367
• Languages: English
• ISSNs: 1862-6300

Abstract

Abstract : The performance of organic photovoltaic cells depends on different properties of the organic materials, such as carrier mobility, band structure, morphology, and crystallinity. For AlPcCl, it is shown that these properties are dependent on the layer deposition rates. As the deposition rate increases, the surface roughness of AlPcCl layers decreases. In contrast, the crystallinity of the layers increases as the deposition rate decreases, thereby increasing the hole mobility value. These effects are opposed: the former effect allows higher open circuit voltages to be obtained as the deposition rate increases, whereas the latter increases the short circuit current as the deposition rate decreases. Therefore, there is a trade‐off between open and short circuit current values, and it is necessary to find the best deposition rate for AlPcCl. Here, it is shown that the highest mobility carriers in layers deposited slowly allow the use of thicker AlPcCl layers, which permits acceptable open circuit voltage values and optimum photovoltaic cell efficiencies to be obtained. This results in an optimum efficiency value of 3.97% for a 26‐nm‐thick AlPcCl film that is deposited at 0.02–0.03 nm s −1 . Abstract : Optimum performances of solar cells using AlPcCl as a donor depend on the deposition rate : surface roughness decreases while the deposition rate increases. Crystallization and hole mobility increase while deposition rate decreases.