Spectroscopy for identification of plasma sources for lithography and water window imaging. (August 2015)

• Record Type: Journal Article
• Authors: O'Sullivan, Gerry; Dunne, Padraig; Higashiguchi, Takeshi; Li, Bowen; Lokasani, Ragava; Long, Elaine; Ohashi, Hayato; O'Reilly, Fergal; Sheridan, Paul; Sheil, John; Sokell, Emma; Suzuki, Chihiro; Wu, Tao
• Is Part Of: Journal of physics. Number 635(2015)
• Publication Date: 2015-08
• Subjects: Physics -- Congresses; 530.5
• DOI: 10.1088/1742-6596/635/9/092037
• Languages: English
• ISSNs: 1742-6588

Abstract

Synopsis: We report on the result of an extensive study of the extreme ultraviolet (EUV) and soft x-ray spectra from laser produced plasmas of a number of medium and high Z metals undertaken to identify potential sources for use with multilayer mirrors as sources for lithography and water window imaging and cell tomography.