Cite
HARVARD Citation
Ohmi, H. et al. (2016). Efficiency of silane gas generation in high-rate silicon etching by narrow-gap microwave hydrogen plasma. Journal of physics. p. . [Online].
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Ohmi, H. et al. (2016). Efficiency of silane gas generation in high-rate silicon etching by narrow-gap microwave hydrogen plasma. Journal of physics. p. . [Online].