Low temperature growth of cobalt on Cr2O3(0 0 0 1). (6th January 2016)

• Record Type: Journal Article
• Authors: Cao, Shi; Zhang, Xin; Komesu, Takashi; Chen, Gong; Schmid, Andrea K; Yue, Lanping; Tanabe, Iori; Echtenkamp, William; Wang, Yi; Binek, Christian; Dowben, P A
• Is Part Of: Journal of physics. Volume 28:Number 4(2016)
• Publication Date: 2016-01-06
• Subjects: chromia -- cobalt film growth -- low energy electron microscopy -- thin film structure and morphology; Condensed matter -- Periodicals; Matière condensée -- Périodiques; Vaste stoffen; Vloeistoffen; Natuurkunde; Electronic journals; Computer network resources; 530.4105
• DOI: 10.1088/0953-8984/28/4/046002
• Languages: English
• ISSNs: 0953-8984

Abstract

Abstract: The thickness and temperature dependence of in situ grown cobalt thin films on Cr2 O3 (0 0 0 1) single crystalline substrate has been studied by low energy electron microscopy (LEEM). The LEEM images indicate that growth of thin Co films (⩽5 monolayers) on chromia at 100 K tends to be continuous and flat with suppressed island growth compared to films grown on chromia at room temperature and above (to ~440 K). Low energy electron diffraction indicates that disorder builds and crystallinity of the cobalt thin film decreases with increased film thickness. Compared with cobalt thin films on Al2 O3 (0 0 0 1) single crystalline substrate, cobalt thin films on Cr2 O3 (0 0 0 1) show larger magnetic contrast in magnetic force microscopy indicating enhancement of perpendicular anisotropy induced by Cr2 O3 .