Cite
HARVARD Citation
Oliveira, A. et al. (n.d.). Split CV mobility at low temperature operation of Ge pFinFETs fabricated with STI first and last processes. Semiconductor science and technology. p. . [Online].
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Oliveira, A. et al. (n.d.). Split CV mobility at low temperature operation of Ge pFinFETs fabricated with STI first and last processes. Semiconductor science and technology. p. . [Online].