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HARVARD Citation
Hänninen, T. et al. (2016). Stoichiometric silicon oxynitride thin films reactively sputtered in Ar/N2O plasmas by HiPIMS. Journal of physics. p. . [Online].
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Hänninen, T. et al. (2016). Stoichiometric silicon oxynitride thin films reactively sputtered in Ar/N2O plasmas by HiPIMS. Journal of physics. p. . [Online].