Preparation and performance study of TiN films deposited by MF unbalanced magnetron sputtering technique. (1st October 2007)

• Record Type: Journal Article
• Authors: Zhang, Y.C.; Wu, Y.F.; Ma, S.G.; Sun, S.N.; Zhou, Y.; Geng, M.
• Is Part Of: International journal of computer applications technology. Volume 29:Number 2-4(2007)
• Page Start: 173
• Page End: 177
• Publication Date: 2007-10-01
• Subjects: pulse bias -- TiN films -- twin middle frequency sputtering -- unbalanced magnetron sputtering -- titanium nitride -- film deposition -- phase structure -- roughness -- thickness -- surface morphology -- colour -- arc ion plating -- TiN coating -- sputtering power -- coating quality; Technology -- Data processing -- Periodicals; 620.00285
• Languages: English
• ISSNs: 0952-8091

Abstract

TiN films on 316L were deposited by Middle Frequency Unbalanced Magnetron Sputtering Plating (MF-UBMSP). The phase structure, roughness, thickness, surface morphology and colour of the films were assessed by using X-Ray Diffraction (XRD), surface profilometer, Scanning Electron Microscope (SEM), spectrophotometer and nanomechanics measuring instrument. The characteristics of the films were compared with TiN films deposited by traditional Arc Ion Plating (AIP). The results show that TiN films can be steadily deposited by middle frequency unbalanced twin target magnetron sputtering under proper parameters. The main phase of the films is TiN. The film is compact, its surface is smooth and its colour is close to the TiN film deposited by AIP. It is concluded that ambience has greatest effect on the component and appearance colour of TiN coating, the pulse bias and sputtering power have influence too. The range of ambience to get perfect gold-like TiN is quite limited. Suitable direct current bias and higher sputtering power are helpful to improve the coating's quality.