Synchronizing Decentralized Control Loops for Overall Performance Enhancement: A Youla Framework Applied to a Wafer Scanner. Issue 1 (July 2017)

• Record Type: Journal Article
• Authors: Evers, Enzo; van de Wal, Marc; Oomen, Tom
• Is Part Of: IFAC-PapersOnLine. Volume 50:Issue 1(2017)
• Page Start: 10845
• Page End: 10850
• Publication Date: 2017-07
• Subjects: Mechatronic systems -- Motion Control Systems -- Decentralized control -- Coupling; Automatic control -- Periodicals; 629.805
• DOI: 10.1016/j.ifacol.2017.08.2382
• Languages: English
• ISSNs: 2405-8963

Abstract

Abstract: Manufacturing equipment often consists of multiple subsystems. For instance, in lithographic IC manufacturing, both a reticle stage and a wafer stage move synchronously. Traditionally, these subsystems are divided into manageable subproblems, at the expense of a suboptimal overall solution. The aim of this paper is to develop a framework for overall system performance improvement. The method pursued in this paper builds on traditional designs, and extends these through a bi-directional controller coupling. The aim here is to optimize a criterion that speciés overall system performance. To achieve this, a new parameterization that relates to the Youla parameterization is developed that connects the bi-directional controller parameter affinely to the overall control criterion, which enables a systematic design. The performance improvement is confirmed in a case study using measured data from an industrial wafer scanner.