Amorphous intergranular films act as ultra-efficient point defect sinks during collision cascades. (1st January 2016)

• Record Type: Journal Article
• Authors: Ludy, Joseph E.; Rupert, Timothy J.
• Is Part Of: Scripta materialia. Volume 110(2016)
• Page Start: 37
• Page End: 40
• Publication Date: 2016-01-01
• Subjects: Grain boundaries -- Interface structure -- Molecular dynamics (MD) -- Nanocomposite -- Amorphous intergranular films; Materials -- Periodicals; Metallurgy -- Periodicals; Metalen; Legeringen; Materiaalkunde; Metals, metalworking and machinery industries; Metals; Electronic journals; 620.11
• DOI: 10.1016/j.scriptamat.2015.07.040
• Languages: English
• ISSNs: 1359-6462

Abstract

Graphical abstract: Abstract: Atomistic simulations are used to explore the effect of interfacial structure on residual radiation damage. Specifically, an ordered grain boundary is compared to a disordered amorphous intergranular film, to investigate how interface thickness and free volume impacts point defect recombination. Collision cascades are simulated and residual point defect populations are analyzed as a function of boundary type and primary knock on atom energy. While ordered grain boundaries easily absorb interstitials, these interfaces are inefficient vacancy sinks. Alternatively, amorphous intergranular films act as ultra-efficient, unbiased defect sinks, providing a path for the creation of radiation-tolerant materials.