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HARVARD Citation
Ramana, C. et al. (n.d.). Effect of oxygen/argon gas ratio on the structure and optical properties of sputter-deposited nanocrystalline HfO2 thin films. Ceramics international. 41 (5), pp. 6187-6193. [Online].
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Ramana, C. et al. (n.d.). Effect of oxygen/argon gas ratio on the structure and optical properties of sputter-deposited nanocrystalline HfO2 thin films. Ceramics international. 41 (5), pp. 6187-6193. [Online].