CMOS-compatible Si3N4 Waveguides for Optical Biosensing. (2015)

• Record Type: Journal Article
• Authors: Muellner, Paul; Melnik, Eva; Koppitsch, Guenther; Kraft, Jochen; Schrank, Franz; Hainberger, Rainer
• Is Part Of: Procedia engineering. Volume 120(2015)
• Page Start: 578
• Page End: 581
• Publication Date: 2015
• Subjects: silicon photonics -- silicon nitride -- PECVD -- optical biosensor; Engineering -- Congresses; Engineering -- Periodicals; Engineering; Conference proceedings; Periodicals; 620.005
• DOI: 10.1016/j.proeng.2015.08.728
• Languages: English
• ISSNs: 1877-7058

Abstract

Abstract: We present a CMOS-compatible silicon nitride (Si3 N4 ) waveguide technology platform suitable for monolithic co-integration with optoelectronics in the visible and <1.1 μm near infrared wavelength region. With an optimized fabrication process employing low-temperature plasma enhanced chemical vapour deposition (PECVD) and reactive ion etching (RIE), propagation losses of 0.86 dB/cm were achieved at λ=850 nm for wire waveguides with a cross section of 600x250 nm 2 . As an example of application we show Mach-Zehnder interferometer based label-free optical detection of the S-protein/S-peptide interaction. Moreover, we present experimental steps towards the realisation of multi-channel biosensors using spiral shaped waveguide structures ensuring a small form factor.