68.2: Study of Optimized Design for High Resistance Black Matrix at In‐cell Touch Structure. Issue 1 (June 2015)

• Record Type: Journal Article
• Authors: Na, Younsung; Park, Chul Ho; Kang, Dongwoo; Choi, Youngseok; Jeon, Suho
• Is Part Of: Digest of technical papers. Volume 46:Issue 1(2015)
• Page Start: 1008
• Page End: 1011
• Publication Date: 2015-06
• Subjects: Black Matrix -- Carbon -- Resistance -- Charge Transfer -- Electron -- Heat resistance Polymer -- Touch performance; Information display systems -- Congresses; 621.3815422
• DOI: 10.1002/sdtp.10333
• Languages: English
• ISSNs: 0097-966X

Abstract

Abstract : In‐cell touch structure requires a high resistance BM (black matrix) because of touch performance. The high resistance BM must have at least 10 13 Ω cm and there should be little variation by thermal stress. In this study, we analyzed BM electric properties variation by thermal stress in post bake.