P‐176L: Late‐News Poster: Deposition and Structuring Processes of a Newly Developed Transparent Amorphous Oxide Semiconductor for the Electron Transport and Injection Layers of AM‐OLEDs. Issue 1 (June 2015)

• Record Type: Journal Article
• Authors: Nakamura, Nobuhiro; Watanabe, Toshinari; Kim, Junghwan; Watanabe, Satoru; Matsuzaki, Eiji; Toda, Yoshitake; Miyakawa, Naomichi; Fujitsu, Satoru; Hosono, Hideo
• Is Part Of: Digest of technical papers. Volume 46:Issue 1(2015)
• Page Start: 1710
• Page End: 1713
• Publication Date: 2015-06
• Subjects: OLED -- Electric injection -- Electric transport -- TAOS; Information display systems -- Congresses; 621.3815422
• DOI: 10.1002/sdtp.10188
• Languages: English
• ISSNs: 0097-966X

Abstract

Abstract : Processes of a new transparent amorphous oxide semiconductor (TAOS) as ETL and EIL were developed. Conventional processes can be applied for the deposition and structuring of the new TAOS, which enables to fabricate inverted OLEDs. The new TAOS materials make it possible to realize thicker ETL, potentially giving impacts not only on yield, but also on higher aperture ratio and cost reduction by omitting resin banks.