Cite
HARVARD Citation
Hu, K. et al. (2017). Effect of the electric-field distribution on the morphology of dot-array gratings fabricated by AFM-based nanolithography. International journal of nanomanufacturing. pp. 23-32. [Online].
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Hu, K. et al. (2017). Effect of the electric-field distribution on the morphology of dot-array gratings fabricated by AFM-based nanolithography. International journal of nanomanufacturing. pp. 23-32. [Online].