A Simple Model for Ion Flux‐Energy Distribution Functions in Capacitively Coupled Radio‐Frequency Plasmas Driven by Arbitrary Voltage Waveforms. Issue 4 (28th October 2016)

• Record Type: Journal Article
• Authors: Schüngel, Edmund; Donkó, Zoltán; Schulze, Julian
• Other Names: Bogaerts Annemie guestEditor.; Alves Luís Lemos guestEditor.
• Is Part Of: Plasma processes and polymers. Volume 14:Issue 4/5(2017)
• Page Start: n/a
• Page End: n/a
• Publication Date: 2016-10-28
• Subjects: capacitively coupled radio frequency plasmas -- ion bombardment -- ion‐energy distribution function (IEDF) -- plasma modeling -- radio frequency glow discharges (RFGD); Plasma polymerization -- Periodicals; Plasma-enhanced chemical vapor deposition -- Periodicals; Plasma chemistry -- Periodicals
• DOI: 10.1002/ppap.201600117
• Languages: English
• ISSNs: 1612-8850

Abstract

Abstract : The ion flux‐energy distribution function (IFEDF) is of crucial importance for surface processing applications of capacitively coupled radio‐frequency (CCRF) plasmas. Here, we propose a model that allows for the determination of the IFEDF in such plasmas for various gases and pressures in both symmetric and asymmetric configurations. A simplified ion density profile and a quadratic charge voltage relation for the plasma sheaths are assumed in the model, of which the performance is evaluated for single‐ as well as multi‐frequency voltage waveforms. The IFEDFs predicted by this model are compared to those obtained from PIC/MCC simulations and retarding field energy analyzer measurements. Furthermore, the development of the IFEDF shape and the ion dynamics in the plasma sheath region are discussed in detail based on the spatially and temporally resolved model data. Abstract : The bombardment by energetic ions plays a key role in surface processing applications of capacitive discharges. We study the complex ion dynamics and the formation of the ion flux‐energy distribution function (IFEDF) in the radio‐frequency sheath. A simple model is introduced, which allows for the calculation of the IFEDF at various gas pressures, and voltage waveforms. It is validated in comparisons with PIC/MCC simulation results and measurements.