Directed self-assembly of a high-chi block copolymer for the fabrication of optical nanoresonators. Issue 38 (24th September 2018)

• Record Type: Journal Article
• Authors: Rasappa, Sozaraj; Schulte, Lars; Ndoni, Sokol; Niemi, Tapio
• Is Part Of: Nanoscale. Volume 10:Issue 38(2018)
• Page Start: 18306
• Page End: 18314
• Publication Date: 2018-09-24
• Subjects: Nanoscience -- Periodicals; Nanotechnology -- Periodicals; 620.505
• DOI: 10.1039/c8nr05831h
• Languages: English
• ISSNs: 2040-3364

Abstract

Abstract : In this paper, we report on the fabrication of optical nanoresonators using block copolymer lithography. Abstract : In this paper, we report on the fabrication of optical nanoresonators using block copolymer lithography. The nanostructured gratings or nanofins were fabricated using a silicon-containing block copolymer on a chromium coated silicon-on-insulator substrate. The etch resistance of the block copolymer template enables a unique patterning technique for high-aspect-ratio silicon nanofins. Integration of the directed self-assembly with nanoimprint lithography provides a well-aligned array of nanofins with a depth of ∼125 nm on a wafer scale. The developed nanopatterning method is an alternative to the previously reported nanopatterning techniques utilizing block copolymers. A dense array of sub-10 nm nanofins is used to realize a photonic guided-mode resonance filter. The nanostructured grating provides high sensitivity in refractive index sensing, as demonstrated by simulations and experiments in measuring varying contents of the tetrahydrofuran solvent.