Cite
HARVARD Citation
Jiang, S. et al. (2016). Microstructure, optical and electrical properties of sputtered HfTiO high-k gate dielectric thin films. Ceramics international. 42 (10), pp. 11640-11649. [Online].
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Jiang, S. et al. (2016). Microstructure, optical and electrical properties of sputtered HfTiO high-k gate dielectric thin films. Ceramics international. 42 (10), pp. 11640-11649. [Online].