Photoresist-less patterning of silicone substrates for thick film deposition. (April 2016)
- Record Type:
- Journal Article
- Title:
- Photoresist-less patterning of silicone substrates for thick film deposition. (April 2016)
- Main Title:
- Photoresist-less patterning of silicone substrates for thick film deposition
- Authors:
- Mergen, Silvana
Johnston, Benjamin
Cowan, Robert
Newbold, Carrie - Abstract:
- Abstract: Traditionally, fabrication processes to produce microelectrode arrays for neural stimulating electrodes have employed photolithography and a photoresist layer to produce a pattern on a substrate which subsequently has a metal layer deposited. The deposited metal layer is then used to create stimulating electrodes that will ultimately be in close contact with neural tissue. While the process enables accurate fabrication at a reasonable cost, the use of photoresist in the process presents a number of issues. Photoresist is a contamination risk with the potential for chemicals to be absorbed into the silicone, which will then subsequently be in close proximity to neural structures, introducing a risk of toxicity. In addition, due to the use of flexible substrates such as silicone elastomer, patterning of films greater than 1 μm thick can be difficult. Whilst an obvious solution would be to avoid using photoresist in the fabrication process, few alternatives have been systematically investigated. We investigated use of shadow masks fabricated from glass, brass and silicone elastomer, and exploitation of the natural tackiness of the silicone substrate for mask adhesion. All three mask materials attached well to silicone, but each presented differing degrees of difficulty during alignment and mask removal. Subsequently, thin gold films (∼20 nm) and thick platinum films (∼8 μm) were deposited on the silicone substrates using the shadow masks. We discuss the maskAbstract: Traditionally, fabrication processes to produce microelectrode arrays for neural stimulating electrodes have employed photolithography and a photoresist layer to produce a pattern on a substrate which subsequently has a metal layer deposited. The deposited metal layer is then used to create stimulating electrodes that will ultimately be in close contact with neural tissue. While the process enables accurate fabrication at a reasonable cost, the use of photoresist in the process presents a number of issues. Photoresist is a contamination risk with the potential for chemicals to be absorbed into the silicone, which will then subsequently be in close proximity to neural structures, introducing a risk of toxicity. In addition, due to the use of flexible substrates such as silicone elastomer, patterning of films greater than 1 μm thick can be difficult. Whilst an obvious solution would be to avoid using photoresist in the fabrication process, few alternatives have been systematically investigated. We investigated use of shadow masks fabricated from glass, brass and silicone elastomer, and exploitation of the natural tackiness of the silicone substrate for mask adhesion. All three mask materials attached well to silicone, but each presented differing degrees of difficulty during alignment and mask removal. Subsequently, thin gold films (∼20 nm) and thick platinum films (∼8 μm) were deposited on the silicone substrates using the shadow masks. We discuss the mask fabrication, pattern definition, the difficulties which arose, and the benefits of using shadow masks for the fabrication of medical devices. … (more)
- Is Part Of:
- Journal of manufacturing processes. Volume 22(2016)
- Journal:
- Journal of manufacturing processes
- Issue:
- Volume 22(2016)
- Issue Display:
- Volume 22, Issue 2016 (2016)
- Year:
- 2016
- Volume:
- 22
- Issue:
- 2016
- Issue Sort Value:
- 2016-0022-2016-0000
- Page Start:
- 21
- Page End:
- 25
- Publication Date:
- 2016-04
- Subjects:
- MAE microelectrode array -- MEMS microelectromechanical systems
Thick film -- Sputter deposition -- Platinum electrodes -- Microelectrode arrays -- Photoresist-less manufacturing -- Shadow masks
Production management -- Data processing -- Periodicals
Manufacturing processes -- Periodicals
Procestechnologie
Productietechniek
Production -- Gestion -- Informatique -- Périodiques
Fabrication -- Périodiques
Manufacturing processes
Production management -- Data processing
Periodicals
670.5 - Journal URLs:
- http://www.sciencedirect.com/science/journal/15266125 ↗
http://www.elsevier.com/journals ↗ - DOI:
- 10.1016/j.jmapro.2016.01.005 ↗
- Languages:
- English
- ISSNs:
- 1526-6125
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 5011.640000
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- 7880.xml