Catalytic activity of pure Ni and Ni-33%Cu for dehydrogenation during graphene growth by chemical vapour deposition. (2018)

• Record Type: Journal Article
• Authors: Sasidhar, K.N.; Srivastava, Ananya; Bera, Parthasarathi; Lahiri, Indranil
• Is Part Of: Materials today. Volume 5:Number 9(2018)Part 1
• Page Start: 17284
• Page End: 17292
• Publication Date: 2018
• Subjects: Chemical Vapour Deposition -- Graphene Growth Mechanism -- Catalytic Dehydrogenation -- Raman Spectroscopy; Materials science -- Congresses -- Periodicals; 620.1
• DOI: 10.1016/j.matpr.2018.04.140
• Languages: English
• ISSNs: 2214-7853

Abstract

Abstract: Dissociative chemisorption of CH4 /H2 gas mixture during graphene growth was investigated on commercially available Ni and Ni-33wt.% Cu substrates. Catalytic activity of both the substrates was severely decreased by employing very low gas pressure, thereby allowing the examination of very initial stages of dissociative-chemisorption. The chemisorption characteristics of the nickel rich nickel-copper alloy were interestingly found to be similar to those of pure copper, i.e., preferential adsorption of hydrogen over methane. These observations led to an in-depth understanding of the graphene growth mechanism on these substrates.