Atomically resolved chemical ordering at the nm-thick TiO precipitate/matrix interface in V-4Ti-4Cr alloy. (1st January 2017)

• Record Type: Journal Article
• Authors: Impagnatiello, A.; Hernandez-Maldonado, D.; Bertali, G.; Prestat, E.; Kepaptsoglou, D.; Ramasse, Q.; Haigh, S.J.; Jimenez-Melero, E.
• Is Part Of: Scripta materialia. Volume 126(2017)
• Page Start: 50
• Page End: 54
• Publication Date: 2017-01-01
• Subjects: Refractory metal -- Crystalline oxides -- Lattice defects -- High-resolution electron microscopy -- Nuclear fusion reactor; Materials -- Periodicals; Metallurgy -- Periodicals; Metalen; Legeringen; Materiaalkunde; Metals, metalworking and machinery industries; Metals; Electronic journals; 620.11
• DOI: 10.1016/j.scriptamat.2016.08.016
• Languages: English
• ISSNs: 1359-6462

Abstract

Abstract: We have used advanced analytical electron microscopy to characterise the local structure and chemistry at the interface between nm-thick TiO precipitates and the V-based matrix in a V-4Ti-4Cr alloy. Our results reveal the presence of an intergrowth between the fcc TiO and bcc vanadium structures, with a repeat lattice distance that equals 2.5 times the vanadium lattice parameter along the c-axis. Our atomic resolution analysis of the interface will impact the mechanistic understanding of its interaction with interstitials and radiation-induced lattice defects, and consequently trigger the development of improved alloy structures with interfaces engineered for enhanced radiation tolerance. Graphical abstract: