Atomic Layer Deposition: Circular Double‐Patterning Lithography Using a Block Copolymer Template and Atomic Layer Deposition (Adv. Mater. Interfaces 16/2018). Issue 16 (23rd August 2018)

• Record Type: Journal Article
• Authors: Wan, Zhixin; Lee, Ha Jin; Kim, Hyun Gu; Jo, Gyeong Cheon; Park, Woon Ik; Ryu, Seung Wook; Lee, Han‐Bo‐Ram; Kwon, Se‐Hun
• Is Part Of: Advanced materials interfaces. Volume 5:Issue 16(2018)
• Page Start: n/a
• Page End: n/a
• Publication Date: 2018-08-23
• Subjects: atomic layer deposition (ALD) -- block copolymer (BCP) -- double‐patterning (DP) lithography -- n‐ZnO/p‐Si NTs/NRs -- self‐assembly; Materials science -- Periodicals; 620.11
• DOI: 10.1002/admi.201870078
• Languages: English
• ISSNs: 2196-7350

Abstract

Abstract : An approach that combines a bottom‐up self‐assembly process and a top‐down semiconductor fabrication process is suggested for nanoscale fabrication. Well‐aligned nanotube and nanorod junction structures are successfully fabricated through the circular double patterning method using diblock copolymer and atomic layer deposition, and applied to controls of reflectivity and wettability. This is reported by Zhixin Wan, Han‐Bo‐Ram Lee, Se‐Hun Kwon and co‐workers in article number1800054 .