Hard X-ray beam damage study of monolayer Ni islands using SX-STM. Issue 1754 (2015)

• Record Type: Journal Article
• Authors: Shirato, Nozomi; Cummings, Marvin; Kersell, Heath; Li, Yang; Miller, Dean; Rosenmann, Daniel; Hla, Saw-Wai; Rose, Volker
• Editors: Barabash, R.; Benning, L.G.; Genc, A.; Kim, Y.; Lereu, A.; Li, D.; Lienert, U.; Liss, K.D.; Ohnuma, M.; Ovchinnikova, O.; Passian, A.; Rimer, J.D.; Tetard, L.; Thundat, T.; Zenobi, R.; Zorba, V.
• Is Part Of: MRS proceedings. Issue 1754:(2015)
• Page Start: 135
• Page End: 140
• Publication Date: 2015
• Subjects: scanning tunneling microscopy (STM), -- elemental, -- nanostructure; Electrical engineering -- Congresses; Physics -- Congresses; Materials -- Research -- Congresses; Materials science -- Congresses; 620.11
• DOI: 10.1557/opl.2015.114
• Languages: English
• ISSNs: 0272-9172

Abstract

ABSTRACT: X-ray beam-induced damage in nanoscale metal islands was investigated. Monolayer-high Ni islands were prepared on a Cu(111) substrate. High brilliance X-rays with photon energies between 8.45 and 8.85 keV illuminated the sample for about 11 hours. In order to track changes in the morphology of the islands, the synchrotron X-ray scanning tunneling microscopy (SX-STM) technique was utilized. The result shows that X-ray illumination onto Ni islands does not induce noticeable damage. The study demonstrates that local beam-induced changes can be studied using SX-STM.