Impact of potential barrier on electronic resistive switching performance based on Al/TiOx/Al structure. (October 2018)
- Record Type:
- Journal Article
- Title:
- Impact of potential barrier on electronic resistive switching performance based on Al/TiOx/Al structure. (October 2018)
- Main Title:
- Impact of potential barrier on electronic resistive switching performance based on Al/TiOx/Al structure
- Authors:
- Wan, Shangfei
Yan, Yu
Wang, Chen
Yang, Zhengchun
Zhao, Jinshi - Abstract:
- Abstract: The thickness-dependent electronic bipolar resistive switching (eBRS) behaviors in Al/TiOx /Al (ATA) structure were examined based on the I-V sweep and endurance test. The trap mediated space charge limited conduction was confirmed through the fitting of the I-V curves. The ATA devices showed the different endurance trends and performance with the TiOx thickness. ATA with 80 nm TiOx maintained the longest endurance cycles compared with 50 nm and 110 nm_TiOx . For 110 nm_TiOx, the slope of the trap-filling region increased with RS cycles which differed from other two cases, suggesting the RS is closely related to the electron trapping and detrapping rather than oxygen ion. Overall, the endurance performance based on eBRS was affected by the formation of interfacial layer (IL) of AlOx during TiOx deposition, wherein the IL AlOx increased with increasing TiOx deposition time due to the higher oxidation potential of Al. The IL AlOx plays a role in determining the potential barrier height that adjusts the amount of trapped and detrapped electrons, is presented. In addition, the effect of the potential barrier at the interface of top electrode (TE) on endurance performance was also investigated by inserting a 1 nm_Al. Graphical abstract: Highlights: Al/TiOx /Al devices showed the different endurance trends and performance with the TiOx thickness. It proved that the thickness of the interfacial layer (IL) AlTiOx was controlled through varying the thickness of TiOx by TEMAbstract: The thickness-dependent electronic bipolar resistive switching (eBRS) behaviors in Al/TiOx /Al (ATA) structure were examined based on the I-V sweep and endurance test. The trap mediated space charge limited conduction was confirmed through the fitting of the I-V curves. The ATA devices showed the different endurance trends and performance with the TiOx thickness. ATA with 80 nm TiOx maintained the longest endurance cycles compared with 50 nm and 110 nm_TiOx . For 110 nm_TiOx, the slope of the trap-filling region increased with RS cycles which differed from other two cases, suggesting the RS is closely related to the electron trapping and detrapping rather than oxygen ion. Overall, the endurance performance based on eBRS was affected by the formation of interfacial layer (IL) of AlOx during TiOx deposition, wherein the IL AlOx increased with increasing TiOx deposition time due to the higher oxidation potential of Al. The IL AlOx plays a role in determining the potential barrier height that adjusts the amount of trapped and detrapped electrons, is presented. In addition, the effect of the potential barrier at the interface of top electrode (TE) on endurance performance was also investigated by inserting a 1 nm_Al. Graphical abstract: Highlights: Al/TiOx /Al devices showed the different endurance trends and performance with the TiOx thickness. It proved that the thickness of the interfacial layer (IL) AlTiOx was controlled through varying the thickness of TiOx by TEM in TiOx /Al (BE) structure. The endurance performance based on eBRS, affected by the formation of interfacial layer (IL) of AlOx, is investigated thoroughly. … (more)
- Is Part Of:
- Vacuum. Volume 156(2018)
- Journal:
- Vacuum
- Issue:
- Volume 156(2018)
- Issue Display:
- Volume 156, Issue 2018 (2018)
- Year:
- 2018
- Volume:
- 156
- Issue:
- 2018
- Issue Sort Value:
- 2018-0156-2018-0000
- Page Start:
- 91
- Page End:
- 96
- Publication Date:
- 2018-10
- Subjects:
- Electronic bipolar resistive switching -- TiOx -- Endurance -- Space charge limited conduction
Vacuum -- Periodicals
621.55 - Journal URLs:
- http://www.elsevier.com/journals ↗
http://www.sciencedirect.com/science/journal/0042207X ↗ - DOI:
- 10.1016/j.vacuum.2018.07.018 ↗
- Languages:
- English
- ISSNs:
- 0042-207X
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 9139.000000
British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store - Ingest File:
- 7268.xml