Metal-agglomeration-suppressed growth of MoS2 and MoSe2 films with small sulfur and selenium molecules for high mobility field effect transistor applications. Issue 32 (31st July 2018)
- Record Type:
- Journal Article
- Title:
- Metal-agglomeration-suppressed growth of MoS2 and MoSe2 films with small sulfur and selenium molecules for high mobility field effect transistor applications. Issue 32 (31st July 2018)
- Main Title:
- Metal-agglomeration-suppressed growth of MoS2 and MoSe2 films with small sulfur and selenium molecules for high mobility field effect transistor applications
- Authors:
- Jung, Kwang Hoon
Yun, Sun Jin
Choi, Yongsuk
Cho, Jeong Ho
Lim, Jung Wook
Chai, Hyun-Jun
Cho, Dae-Hyung
Chung, Yong-Duck
Kim, Gayoung - Abstract:
- Abstract : This work reports an innovative method for achieving high quality MoS2 and MoSe2 films uniformly on large-area wafers at growth temperatures of 600 °C or lower. Abstract : This work reports a breakthrough technique for achieving high quality and uniform molybdenum dichalcogenide (MoX2 where X = S, Se) films on large-area wafers via metal-agglomeration-suppressed growth (MASG) with small chalcogen (X-) molecules at growth temperatures ( T G ) of 600 °C or lower. In order to grow MoS2 films suitable for field effect transistors (FETs), S-molecules should be pre-deposited on Mo films at 60 °C prior to heating the substrate up to T G . The pre-deposited S-molecules successfully suppressed the agglomeration of Mo during sulfurization and prevented the formation of protruding islands in the resultant sulfide films. The small X-molecules supplied from a thermal cracker reacted with Mo-precursor film to form MoX2 . The film quality strongly depends on the temperatures of cracking and reservoir zones, as well as T G . The MoS2 film grown at 570 °C showed a thickness variation of less than 3.3% on a 6 inch-wafer. The mobility and on/off current ratio of 6.1 nm-MoS2 FET at T G = 570 °C were 59.8 cm 2 V −1 s −1 and 10 5, respectively. The most significant advantages of the MASG method proposed in this work are its expandability to various metal dichalcogenides on larger substrates as well as a lower T G enabled by using reactive small molecules supplied from a cracker, forAbstract : This work reports an innovative method for achieving high quality MoS2 and MoSe2 films uniformly on large-area wafers at growth temperatures of 600 °C or lower. Abstract : This work reports a breakthrough technique for achieving high quality and uniform molybdenum dichalcogenide (MoX2 where X = S, Se) films on large-area wafers via metal-agglomeration-suppressed growth (MASG) with small chalcogen (X-) molecules at growth temperatures ( T G ) of 600 °C or lower. In order to grow MoS2 films suitable for field effect transistors (FETs), S-molecules should be pre-deposited on Mo films at 60 °C prior to heating the substrate up to T G . The pre-deposited S-molecules successfully suppressed the agglomeration of Mo during sulfurization and prevented the formation of protruding islands in the resultant sulfide films. The small X-molecules supplied from a thermal cracker reacted with Mo-precursor film to form MoX2 . The film quality strongly depends on the temperatures of cracking and reservoir zones, as well as T G . The MoS2 film grown at 570 °C showed a thickness variation of less than 3.3% on a 6 inch-wafer. The mobility and on/off current ratio of 6.1 nm-MoS2 FET at T G = 570 °C were 59.8 cm 2 V −1 s −1 and 10 5, respectively. The most significant advantages of the MASG method proposed in this work are its expandability to various metal dichalcogenides on larger substrates as well as a lower T G enabled by using reactive small molecules supplied from a cracker, for which temperature is independently controlled. … (more)
- Is Part Of:
- Nanoscale. Volume 10:Issue 32(2018)
- Journal:
- Nanoscale
- Issue:
- Volume 10:Issue 32(2018)
- Issue Display:
- Volume 10, Issue 32 (2018)
- Year:
- 2018
- Volume:
- 10
- Issue:
- 32
- Issue Sort Value:
- 2018-0010-0032-0000
- Page Start:
- 15213
- Page End:
- 15221
- Publication Date:
- 2018-07-31
- Subjects:
- Nanoscience -- Periodicals
Nanotechnology -- Periodicals
620.505 - Journal URLs:
- http://www.rsc.org/Publishing/Journals/NR/Index.asp ↗
http://www.rsc.org/ ↗ - DOI:
- 10.1039/c8nr03778g ↗
- Languages:
- English
- ISSNs:
- 2040-3364
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 9830.266000
British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store - Ingest File:
- 7111.xml