Cite
HARVARD Citation
Miyano, Y. et al. (n.d.). Multiscale modeling for SiO2 atomic layer deposition for high-aspect-ratio hole patterns. Japanese journal of applied physics. p. . [Online].
This is an interim version of our Electronic Legal Deposit Catalogue-eJournals and eBooks while we continue to recover from a cyber-attack.
Miyano, Y. et al. (n.d.). Multiscale modeling for SiO2 atomic layer deposition for high-aspect-ratio hole patterns. Japanese journal of applied physics. p. . [Online].