Front Cover: Surface Engineering of Carbon Nitride Electrode by Molecular Cobalt Species and Their Photoelectrochemical Application (Chem. Asian J. 12/2018). Issue 12 (30th May 2018)

• Record Type: Journal Article
• Authors: Chen, Zupeng; Wang, Hongqiang; Xu, Jingsan; Liu, Jian
• Is Part Of: Chemistry, an Asian journal. Volume 13:Issue 12(2018)
• Page Start: 1516
• Page End: 1516
• Publication Date: 2018-05-30
• Subjects: cobalt -- electrodes -- graphitic carbon nitrides -- photoelectrochemical application -- thin films; Chemistry -- Periodicals; 540.5
• DOI: 10.1002/asia.201800621
• Languages: English
• ISSNs: 1861-4728

Abstract

Abstract : Minimizing the overpotential ! A functional graphitic carbon nitride thin film was prepared via a versatile microprinting‐based direct growth method using nitrogen‐rich cyanamide as the "ink" and anodic aluminum oxide as the "stamp". The photoelectrochemical performance was greatly enhanced by surface engineering of molecular cobalt species. In an ultrapure water system, the anodic photocurrent was doubled and the overpotential for water oxidation was reduced to 0.04 V. More information can be found in the Communication by Jian Liu et al. onpage 1539 in Issue 12, 2018 (DOI:10.1002/asia.201800487 ).