Cite
HARVARD Citation
Maman, N. et al. (2018). Postgrowth Control of the Interfacial Oxide Thickness in Semiconductor–Insulator–Semiconductor Heterojunctions. Advanced materials interfaces. 5 (12), p. n/a. [Online].
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Maman, N. et al. (2018). Postgrowth Control of the Interfacial Oxide Thickness in Semiconductor–Insulator–Semiconductor Heterojunctions. Advanced materials interfaces. 5 (12), p. n/a. [Online].