X-ray nanometer focusing at the SSRF based on a multilayer Laue lens*Supported by National Natural Science Foundation of China (U1432244, 11375131) and Major State Basic Research Development Program (2011CB922203). (December 2015)

• Record Type: Journal Article
• Authors: Zhu 朱, Jing-Tao 京涛; Tu 涂, Yu-Chun 昱淳; Li 李, Hao-Chuan 浩川; Yue 岳, Shuai-Peng 帅鹏; Huang 黄, Qiu-Shi 秋实; Li 李, Ai-Guo 爱国; Wang 王, Zhan-Shan 占山
• Is Part Of: Chinese physics C. Volume 39:Number 12(2015:Dec.)
• Publication Date: 2015-12
• Subjects: 42.79.Ci -- 07.85.Tt; hard X-ray -- nano-focusing -- multilayer Laue lens (MLL) -- synchrotron radiation; Particles (Nuclear physics) -- Periodicals; Nuclear physics -- Periodicals; 539.76
• DOI: 10.1088/1674-1137/39/12/128001
• Languages: English
• ISSNs: 1674-1137

Abstract

Abstract: We designed and fabricated a multilayer Laue lens (MLL) as a hard X-ray focusing device. WSi2 /Si multilayers were chosen owing to their excellent optical properties and relatively sharp interface. The multilayer sample was fabricated by using direct current (DC) magnetron sputtering technology and then was sliced and thinned to form an MLL. The thickness of each layer was determined by scanning electron microscopy (SEM) image analysis with marking layers. The focusing property of the MLL was measured at Beamline 15U, Shanghai Synchrotron Facility (SSRF). One-dimensional (1D) focusing resolutions of 92 nm are obtained at photon energy of 14 keV.