Controlling the work function of molybdenum disulfide by in situ metal deposition. (15th July 2016)

• Record Type: Journal Article
• Authors: Zhou, Peng; Song, Xiongfei; Yan, Xiao; Liu, Chunsen; Chen, Lin; Sun, Qingqing; Zhang, David Wei
• Is Part Of: Nanotechnology. Volume 27:Number 34(2016)
• Publication Date: 2016-07-15
• Subjects: in situ metal contact -- molybdenum disulphide -- interface work function; Nanotechnology -- Periodicals; Nanotechnology -- Periodicals; Nanotechnology; Publications périodiques; Nanotechnologies; Periodicals; 620.5
• DOI: 10.1088/0957-4484/27/34/344002
• Languages: English
• ISSNs: 0957-4484

Abstract

Abstract: Control of the work function of molybdenum disulfide (MoS2 ) under ultrathin metal was investigated using in situ metal deposition and direct ultraviolet photoelectron spectroscopy measurement in an ultra-high vacuum system. When the metal thickness turned from two dimensional into bulk, the work function was also raised up at the nickel−MoS2 interface, barely changed at the titanium−MoS2 interface and lowered at the hafnium−MoS2 interface. Meanwhile, the mechanisms of charge transfer and band alignment with metal deposition were also discussed. The Schottky barrier at metal−MoS2 interfaces could be tailored by both types and thicknesses of deposited metal. The low work function metal was a good indicator for MoS2 contact electrodes. It paved the way towards future high performance MoS2 device applications.