Magnetoelastic coupling between NiFe thin film and LiCsSO4 studied by Kerr microscopy. (30th September 2015)

• Record Type: Journal Article
• Authors: Graczyk, Piotr; Schäfer, Rudolf; Mroz, Boguslaw
• Is Part Of: Journal of physics. Volume 48:Number 42(2015)
• Publication Date: 2015-09-30
• Subjects: multiferroic heterostructure -- thin film -- magnetoelastic effect -- Kerr microscopy; Physics -- Periodicals; 530
• DOI: 10.1088/0022-3727/48/42/425002
• Languages: English
• ISSNs: 0022-3727

Abstract

Abstract: One of the crucial features of memory devices should be their non-volatility and resistance to external fields. Strain-driven magnetoelectric multiferroics that consist of ferroelastic components are promising candidates to fulfill these requirements. Here, we quantitatively investigated the evolution of the easy axis of magnetisation in thin ferromagnetic film, emerging from spontaneous strain in the ferroelastic substrate and we rigorously compared it with a theoretical description of magnetoelastic coupling. The magnetoelastic coupling and evolution of magnetic anisotropy with temperature in a LiCsSO4 /NiFe heterostructure was studied by Kerr microscopy. The magnetic domains in the permalloy thin film were found to strictly mimic the ferroelastic pattern of domains in the LiCsSO4 substrate. The temperature dependence of the rotation of the easy axis of magnetisation, induced by changes in the strain developing in the substrate, was obtained from the analysis of hysteresis loops and described within a Stoner-Wohlfarth model.