Reducing the Schottky barrier between few-layer MoTe2 and gold. (14th September 2017)

• Record Type: Journal Article
• Authors: Qi, Dianyu; Wang, Qixing; Han, Cheng; Jiang, Jizhou; Zheng, Yujie; Chen, Wei; Zhang, Wenjing; Wee, Andrew Thye Shen
• Is Part Of: 2D materials. Volume 4:Number 4(2017)
• Publication Date: 2017-09-14
• Subjects: transistors -- phase transition -- MoTe2 -- Schottky barrier; Graphene -- Periodicals; Materials science -- Periodicals; Nanostructured materials -- Periodicals; 620.115
• DOI: 10.1088/2053-1583/aa89fc
• Languages: English
• ISSNs: 2053-1583

Abstract

Abstract: Schottky barriers greatly influence the performance of optoelectronic devices. Schottky barriers can be reduced by harnessing the polymorphism of 2D metal transition dichalcogenides, since both semiconducting and metallic phases exist. However, high energy, high temperature or chemicals are normally required for phase transformation, or the processes are complex. In this work, stable low-resistance contacts between few layer MoTe2 flakes and gold electrodes are achieved by a simple thermal annealing treatment at low temperature (200–400 °C). The resulting Schottky barrier height of the annealed MoTe2 /Au interface is low (~23 meV). A new Raman A g mode of the 1T′ metallic phase of MoTe2 on gold electrode is observed, indicating that the low-resistance contact is due to the phase transition of 2H-MoTe2 . The gold substrate plays an important role in the transformation, and a higher gold surface roughness increases the transformation rate. With this method, the mobility and ON-state current of the MoTe2 transistor increase by ~3–4 orders of magnitude, the photocurrent of vertically stacked graphene/MoTe2 /Au device increases ~300%, and the response time decreases by ~20%.