Effect of charge quantity on conduction mechanism of high- and low-resistance states during forming process in a one-transistor–one-resistor resistance random access memory. (6th April 2017)
- Record Type:
- Journal Article
- Title:
- Effect of charge quantity on conduction mechanism of high- and low-resistance states during forming process in a one-transistor–one-resistor resistance random access memory. (6th April 2017)
- Main Title:
- Effect of charge quantity on conduction mechanism of high- and low-resistance states during forming process in a one-transistor–one-resistor resistance random access memory
- Authors:
- Wu, Cheng-Hsien
Chang, Ting-Chang
Tsai, Tsung-Ming
Chang, Kuan-Chang
Chu, Tian-Jian
Pan, Chih-Hung
Su, Yu-Ting
Chen, Po-Hsun
Lin, Shih-Kai
Hu, Shih-Jie
Sze, Simon M. - Abstract:
- Abstract: The forming process is a necessary and irreversible process to activate the resistance switching behavior in a resistance random access memory (RRAM) device. However, during the forming process, an overshoot current leads to device damage and causes inferior resistance switching characteristics; consequently, the process is considered to be a key factor in device degradation. In this paper, we find that a discontinuous conduction path can be formed by a pulse forming process such that the operation current can be reduced. We further investigate how the charge quantity during the forming process affects the carrier conduction mechanism of HRS, with all experiments and results demonstrated on one-transistor–one-resistor (1T1R) devices.
- Is Part Of:
- Applied physics express. Volume 10:Number 5(2017)
- Journal:
- Applied physics express
- Issue:
- Volume 10:Number 5(2017)
- Issue Display:
- Volume 10, Issue 5 (2017)
- Year:
- 2017
- Volume:
- 10
- Issue:
- 5
- Issue Sort Value:
- 2017-0010-0005-0000
- Page Start:
- Page End:
- Publication Date:
- 2017-04-06
- Subjects:
- Physics -- Periodicals
Technology -- Periodicals
621.05 - Journal URLs:
- http://iopscience.iop.org/1882-0786/ ↗
http://ioppublishing.org/ ↗ - DOI:
- 10.7567/APEX.10.054101 ↗
- Languages:
- English
- ISSNs:
- 1882-0778
- Deposit Type:
- Legaldeposit
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- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store - Ingest File:
- 6516.xml