Nontoxic, Eco‐friendly Fully Water‐Induced Ternary Zr–Gd–O Dielectric for High‐Performance Transistors and Unipolar Inverters. (17th April 2018)
- Record Type:
- Journal Article
- Title:
- Nontoxic, Eco‐friendly Fully Water‐Induced Ternary Zr–Gd–O Dielectric for High‐Performance Transistors and Unipolar Inverters. (17th April 2018)
- Main Title:
- Nontoxic, Eco‐friendly Fully Water‐Induced Ternary Zr–Gd–O Dielectric for High‐Performance Transistors and Unipolar Inverters
- Authors:
- Zhu, Li
He, Gang
Li, Wendong
Yang, Bing
Fortunato, Elvira
Martins, Rodrigo - Abstract:
- Abstract: In this context, a simple, nontoxic, and eco‐friendly fully water‐induced (WI) route to fabricate ternary ZrGdO x thin films at various annealing temperatures is reported. Annealing temperature dependent microstructure, morphology, optical, electrical properties, and chemical bonding states of the WI ZrGdO x thin films are investigated by x‐ray diffraction, atomic force microscopy, optical spectroscopy, x‐ray photoelectron spectroscopy, and electrical measurements. A low leakage current density of 10 −8 A cm −2 at 1 mV cm −1 and a large areal capacitance of 531 nF cm −2 at 20 Hz are observed for 400 °C‐annealed ZrGdO x thin films. To verify the possible applications of ZrGdO x thin films as the gate dielectric in thin‐film transistors (TFTs), WI In2 O3 /ZrGdO x TFTs are integrated. 250 °C‐derived full oxide In2 O3 /ZrGdO x TFTs have demonstrated high electrical performance and low operating voltage, including high µ FE of 18.82 cm 2 V −1 S −1, threshold voltage shift of 0.46 V under positive bias stress for 3600 s, and a large I on / I off of 6.01 × 10 7, respectively. Finally, a low voltage resistor‐loaded unipolar inverter is built using In2 O3 /ZrGdO x TFT, exhibiting a linear relationship between supplied voltage and gain voltage and a maximum gain of 7.4 at 2.5 V. These optimized parameters have achieved a low operating voltage of 2 V, which represents a great step toward the achievement of low‐cost, low‐power consumption, and large‐area all‐oxide flexibleAbstract: In this context, a simple, nontoxic, and eco‐friendly fully water‐induced (WI) route to fabricate ternary ZrGdO x thin films at various annealing temperatures is reported. Annealing temperature dependent microstructure, morphology, optical, electrical properties, and chemical bonding states of the WI ZrGdO x thin films are investigated by x‐ray diffraction, atomic force microscopy, optical spectroscopy, x‐ray photoelectron spectroscopy, and electrical measurements. A low leakage current density of 10 −8 A cm −2 at 1 mV cm −1 and a large areal capacitance of 531 nF cm −2 at 20 Hz are observed for 400 °C‐annealed ZrGdO x thin films. To verify the possible applications of ZrGdO x thin films as the gate dielectric in thin‐film transistors (TFTs), WI In2 O3 /ZrGdO x TFTs are integrated. 250 °C‐derived full oxide In2 O3 /ZrGdO x TFTs have demonstrated high electrical performance and low operating voltage, including high µ FE of 18.82 cm 2 V −1 S −1, threshold voltage shift of 0.46 V under positive bias stress for 3600 s, and a large I on / I off of 6.01 × 10 7, respectively. Finally, a low voltage resistor‐loaded unipolar inverter is built using In2 O3 /ZrGdO x TFT, exhibiting a linear relationship between supplied voltage and gain voltage and a maximum gain of 7.4 at 2.5 V. These optimized parameters have achieved a low operating voltage of 2 V, which represents a great step toward the achievement of low‐cost, low‐power consumption, and large‐area all‐oxide flexible electronics. Abstract : A simple, nontoxic, and eco‐friendly fully water‐induced route is adopted to fabricate the In2 O3 /ZrGdO x thin‐film transistor and its application in a resistor‐loaded unipolar inverter is investigated. The achieved excellent performance in complementary metal oxide semiconductor logics represents a great step toward the achievement of low‐cost, low‐power consumption, and large‐area all‐oxide flexible electronics. … (more)
- Is Part Of:
- Advanced Electronic Materials. Volume 4:Number 5(2018)
- Journal:
- Advanced Electronic Materials
- Issue:
- Volume 4:Number 5(2018)
- Issue Display:
- Volume 4, Issue 5 (2018)
- Year:
- 2018
- Volume:
- 4
- Issue:
- 5
- Issue Sort Value:
- 2018-0004-0005-0000
- Page Start:
- n/a
- Page End:
- n/a
- Publication Date:
- 2018-04-17
- Subjects:
- eco‐friendly electronics -- electrical properties -- high‐k gate dielectrics -- thin‐film transistors -- water‐induced method
Materials -- Electric properties -- Periodicals
Materials science -- Periodicals
Magnetic materials -- Periodicals
Electronic apparatus and appliances -- Periodicals
537 - Journal URLs:
- http://onlinelibrary.wiley.com/journal/10.1002/(ISSN)2199-160X ↗
http://onlinelibrary.wiley.com/ ↗ - DOI:
- 10.1002/aelm.201800100 ↗
- Languages:
- English
- ISSNs:
- 2199-160X
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 0696.848400
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 6504.xml