Large area manufacturing of plasmonic colour filters using substrate conformal imprint lithography. Issue 1 (24th April 2017)

• Record Type: Journal Article
• Authors: Rumler, M; Foerthner, M; Baier, L; Evanschitzky, P; Becker, M; Rommel, M; Frey, L
• Is Part Of: Nano futures. Volume 1:Issue 1(2017)
• Publication Date: 2017-04-24
• Subjects: nanoimprint lithography -- plasmonics -- colour filter -- soft lithography; Nanoscience -- Periodicals; 620.5
• DOI: 10.1088/2399-1984/aa6560
• Languages: English
• ISSNs: 2399-1984

Abstract

Abstract: This work presents the large area fabrication of plasmonic colour filters consisting of subwavelength apertures in aluminium films of different thicknesses. Wafer-scale pattern transfer was realized by a soft lithography technique (substrate conformal imprint lithography). The fabricated colour filters have an active area of up to 145 cm 2 which presents a considerable increase compared to previously published results. In addition to experimental investigations, simulations of the transmission behaviour were performed using a rigorous electromagnetic field solver based on an extended RCWA approach. Furthermore, the use of a spin-coated cover layer consisting of the UV-curable hybrid polymer OrmoComp ® instead of often applied PECVD-SiO2 was investigated.