Cite
HARVARD Citation
Zhou, M. et al. (2015). Porous low k film with multilayer structure used for promoting adhesion to SiCN cap barrier layer. Microelectronics and reliability. 55 (6), pp. 879-885. [Online].
This is an interim version of our Electronic Legal Deposit Catalogue-eJournals and eBooks while we continue to recover from a cyber-attack.
Zhou, M. et al. (2015). Porous low k film with multilayer structure used for promoting adhesion to SiCN cap barrier layer. Microelectronics and reliability. 55 (6), pp. 879-885. [Online].