Restoration of obliterated engraved marks on steel surfaces by chemical etching reagent. (May 2015)

• Record Type: Journal Article
• Authors: Song, Qingfang
• Is Part Of: Forensic science international. Volume 250(2015)
• Page Start: 33
• Page End: 36
• Publication Date: 2015-05
• Subjects: Chemical etching -- Steel surface -- Obliterated engraved marks -- Oxidizer -- Coordinating agent -- Restoration; Medical jurisprudence -- Periodicals; Chemistry, Forensic -- Periodicals; Forensic Medicine -- Periodicals; Médecine légale -- Périodiques; Chimie légale -- Périodiques; Gerechtelijke geneeskunde; Gerechtelijke chemie; Gerechtelijke psychiatrie; Chemistry, Forensic; Medical jurisprudence; Electronic journals; Periodicals; Electronic journals; 614.1
• DOI: 10.1016/j.forsciint.2015.02.018
• Languages: English
• ISSNs: 0379-0738

Abstract

Highlights: New high efficient etching agents for restoration of obliterated engraved marks are developed. Steel materials from both motorcycle and car frame are tested. Etching kinetics is compared based on chemistry principles. Abstract: Chemical etching technique is widely used for restoration of obliterated engraved marks on steel surface in the field of public security. The consumed thickness of steel surface during restoration process is considered as a major criterion for evaluating the efficiency of the chemical etching reagent. The thinner the consumed thickness, the higher the restoration efficiency. According to chemical principles, maintaining the continuous oxidative capabilities of etching reagents and increasing the kinetic rate difference of the reaction between the engraved and non-engraved area with the chemical etching reagent can effectively reduce the consumed steel thickness. The study employed steel surface from the engine case of motorcycle and the car frame of automobile. The chemical etching reagents are composed of nitric acid as the oxidizer, hydrofluoric acid as the coordination agent and mixed with glacial acetic acid or acetone as the solvents. Based on the performance evaluation of three different etching reagents, the one composed of HNO3, HF and acetone gave the best result.