Cite
HARVARD Citation
Bleykher, G. et al. (2018). The role of thermal processes and target evaporation in formation of self-sputtering mode for copper magnetron sputtering. Vacuum. pp. 156-165. [Online].
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Bleykher, G. et al. (2018). The role of thermal processes and target evaporation in formation of self-sputtering mode for copper magnetron sputtering. Vacuum. pp. 156-165. [Online].