Efficient photocatalytic fixation of N2 by KOH-treated g-C3N4. Issue 7 (25th January 2018)

• Record Type: Journal Article
• Authors: Li, Xiaoman; Sun, Xiang; Zhang, Ling; Sun, Songmei; Wang, Wenzhong
• Is Part Of: Journal of materials chemistry. Volume 6:Issue 7(2018)
• Page Start: 3005
• Page End: 3011
• Publication Date: 2018-01-25
• Subjects: Materials -- Research -- Periodicals; Chemistry, Analytic -- Periodicals; Environmental sciences -- Research -- Periodicals; 543.0284
• DOI: 10.1039/c7ta09762j
• Languages: English
• ISSNs: 2050-7488

Abstract

Abstract : The photocatalytic N2 conversion to NH3 over KOH-treated g-C3 N4 under mild condition is a high-efficiency process. Abstract : Development of N2 photofixation under mild conditions is challenging; one reason for low efficiency is the poor reactivity between water and photocatalysts. Herein, C3 N4 after KOH etching was used as an efficient photocatalyst, and CH3 OH was first introduced as a proton source. The photocatalyst presented a high ammonia evolution rate of 3.632 mmol g −1 h −1 and achieved an apparent quantum yield of 21.5% at ∼420 nm. In addition to the role of reacting with holes to accelerate the production and transfer of electrons, CH3 OH also promoted the solubility of N2 and provided a proton to the activated N2 . The CH3 OH system should be instructive for a better understanding of proton-enhanced photocatalysis.