Atomic layer deposition of nickel carbide for supercapacitors and electrocatalytic hydrogen evolution. Issue 10 (5th January 2018)

• Record Type: Journal Article
• Authors: Xiong, Wei; Guo, Qun; Guo, Zheng; Li, Hao; Zhao, Ran; Chen, Qiang; Liu, Zhongwei; Wang, Xinwei
• Is Part Of: Journal of materials chemistry. Volume 6:Issue 10(2018)
• Page Start: 4297
• Page End: 4304
• Publication Date: 2018-01-05
• Subjects: Materials -- Research -- Periodicals; Chemistry, Analytic -- Periodicals; Environmental sciences -- Research -- Periodicals; 543.0284
• DOI: 10.1039/c7ta10202j
• Languages: English
• ISSNs: 2050-7488

Abstract

Abstract : We report a new ALD process for Ni3 C and explore its applications for supercapacitors and electrocatalytic H2 evolution. Abstract : We report a new atomic layer deposition (ALD) process for nickel carbide (Ni3 C). The process uses bis(1, 4-di- tert -butyl-1, 3-diazabutadienyl)nickel(ii ) and H2 plasma and is able to produce smooth, pure, crystalline Ni3 C thin films in an ideal self-limiting ALD growth fashion. Using this ALD process, a uniform thin layer of Ni3 C can be conformally coated on carbon nanotubes (CNTs) to afford a core–shell nanostructured Ni3 C/CNT composite. The ALD-prepared Ni3 C/CNT composite is demonstrated to show excellent performance for supercapacitors and electrocatalytic hydrogen evolution.