Beschichtung von gasgetragenen Nanopartikeln mit SiO2 mithilfe eines plasma‐unterstützten CVD‐Prozesses bei Umgebungsbedingungen. Issue 4 (13th February 2018)

• Record Type: Journal Article
• Authors: Post, Patrick; Weber, Alfred P.
• Other Names: Teipel Ulrich guestEditor.; Türk Michael guestEditor.
• Is Part Of: Chemie Ingenieur Technik. Volume 90:Issue 4(2018)
• Page Start: 443
• Page End: 450
• Publication Date: 2018-02-13
• Subjects: Aerosol‐Beschichtung -- kontinuierlicher Gasphasenprozess -- plasmaunterstützte chemische Gasphasenabscheidung -- Siliziumoxid -- Umgebungsbedingungen; Aerosol coating -- Ambient conditions -- Continuous gas‐phase process -- Plasma‐enhanced chemical vapor deposition -- Silicon oxide; Chemical engineering -- Patents -- Periodicals; Chemical engineering -- Periodicals; Chemical industry -- Periodicals; Chemistry, Technical -- Periodicals; 660.05
• DOI: 10.1002/cite.201700109
• Languages: English
• ISSNs: 0009-286X

Abstract

Abstract: A plasma‐assisted aerosol process is presented, which allows the continuous coating of particles with silicon oxide at ambient temperature. A dielectric barrier discharge plasma is applied to produce different reactive species. Tetraethyl orthosilicate is used as precursor. No elevated temperatures are necessary to perform the coating so that even temperature‐sensitive materials can be coated. Another advantage is the independence of the process from the particle source. The successful coating is demonstrated on different particle geometries and materials such as metals, salts and polymers and the dependence of the coating thickness on the particle surface area is shown. Furthermore, the change in particle number concentration along the coating reactor is primarily caused by agglomeration.