Cite
HARVARD Citation
Amaral, A. et al. (2018). Etchability Dependence of InOx and ITO Thin Films by Plasma Enhanced Reactive Thermal Evaporation on Structural Properties and Deposition Conditions. MRS advances. pp. 207-212. [Online].
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Amaral, A. et al. (2018). Etchability Dependence of InOx and ITO Thin Films by Plasma Enhanced Reactive Thermal Evaporation on Structural Properties and Deposition Conditions. MRS advances. pp. 207-212. [Online].